Facilities
Electrochemistry/Photoelectrochemistry

In our team, we have several
potentiostats/galvanostats to perform anodic oxidation of Al and Ti to grow porous Al
2O
3 membranes and TiO
2 nanotubes, respectively. They are also used to perform electrochemical deposition of various materials within these nanostructures and to carry out both DC- and AC-electrochemical characterizations. The group uses a high voltage (100 V) potentiostat for both DC- and AC-electrochemical measurements (Modulab, Solartron) and several a high current analog potentiostats (PAR 173 and 273). In addition, an Agilent
high voltage source (two-electrode configuration) is used for Al high voltage anodization.
The
photoelectrochemical properties of the functionalized surfaces are probed under white light (Apex, Oriel), monochromatic illuminations (Cornerstone 130, Newport) or a
solar simulator (HAL-320, Asahi Spectra) using a PC-controlled potentiostat (PAR 273).
Atomic Layer Deposition

The group uses a Fiji 200
ALD reactor (Veeco/Cambridge Nanotech). The equipment allows for performing both thermal- and plasma-ALD on 200 mm samples. The system contains 4 solid/liquid precursor sources and 5 gas lines. The chamber can operate from room temperature till 400°C and it is equipped with a
quartz crystal microbalance (Inficon), a
spectroscopic ellipsometer (M-2000V, J. A. Woollam Co) to monitor, in realtime, the film thickness and
quadrupole mass spectrometer (HPR30 - 200 amu, Hiden). The reactor is connected to a
glove box (Unilab, MBraun) to manipulate the samples under a controlled atmosphere. A second
glove box (Easylab, Mbraun) to fill sensitive and hazardous precursors.
A second home-made
ALD reactor can operate up to 250°C for thermal processes that contains 4 solid/liquid precursor sources and 3 gas lines.
Lab equipment

The group is equipped with two fume hoods, a spin coater, a chiller and various electrochemical cells.
Tubular furnace (Nabertherm) to perform annealing up to 1500°C in controlled atmosphere.
In addition to those proper equipments, the team accesses to the CINaM's plateforms:
- Scanning electron microscope: JEOL JSM 7900F equipped with a STEM detector (Deben), two EDX detectors (Bruker FlatQuad/xFlash) and high pressure imaging capabilities
- Transmission electron microscopes: JEOL JEM 2100F equipped with an EDX detector for chemical analysis (JEOL JED-2300T) and a tomographic capabilities. JEM 2011 equipped with an EDX detector (Bruker, XFlash)
- Clean room facilities: photo-, laser , e-beam and ion-beam (Raith GmbH) lithographies, etching (RIE, Ar sputtering), evaporation (metals), sputtering (metals and SiO2, Si3N4), electrical measurements
- X-ray diffraction: INEL (CPS 120), Rikagu rotating anode + mar345 2D detector, PANalytical (X'Pert PRO)
- Atomic force microscope (Nanoscope Digital Instruments and PSIA)