Facilities

Electrochemistry/Photoelectrochemistry

Modulab In our team, we have several potentiostats/galvanostats to perform anodic oxidation of Al and Ti to grow porous Al2O3 membranes and TiO2 nanotubes, respectively. They are also used to perform electrochemical deposition of various materials within these nanostructures and to carry out both DC- and AC-electrochemical characterizations. The group uses a high voltage (100 V) potentiostat for both DC- and AC-electrochemical measurements (Modulab, Solartron) and several a high current analog potentiostats (PAR 173 and 273). In addition, an Agilent high voltage source (two-electrode configuration) is used for Al high voltage anodization.

The photoelectrochemical properties of the functionalized surfaces are probed under white light (Apex, Oriel), monochromatic illuminations (Cornerstone 130, Newport) or a solar simulator (HAL-320, Asahi Spectra) using a PC-controlled potentiostat (PAR 273).

Atomic Layer Deposition

Fiji200_thumb The group uses a Fiji 200 ALD reactor (Veeco/Cambridge Nanotech). The equipment allows for performing both thermal- and plasma-ALD on 200 mm samples. The system contains 4 solid/liquid precursor sources and 5 gas lines. The chamber can operate from room temperature till 400°C and it is equipped with a quartz crystal microbalance (Inficon), a spectroscopic ellipsometer (M-2000V, J. A. Woollam Co) to monitor, in realtime, the film thickness and quadrupole mass spectrometer (HPR30 - 200 amu, Hiden). The reactor is connected to a glove box (Unilab, MBraun) to manipulate the samples under a controlled atmosphere. A second glove box (Easylab, Mbraun) to fill sensitive and hazardous precursors.

A second home-made ALD reactor can operate up to 250°C for thermal processes that contains 4 solid/liquid precursor sources and 3 gas lines.

Lab equipment

JSM7900 The group is equipped with two fume hoods, a spin coater, a chiller and various electrochemical cells. Tubular furnace (Nabertherm) to perform annealing up to 1500°C in controlled atmosphere.

In addition to those proper equipments, the team accesses to the CINaM's plateforms:
  • Scanning electron microscope: JEOL JSM 7900F equipped with a STEM detector (Deben), two EDX detectors (Bruker FlatQuad/xFlash) and high pressure imaging capabilities
  • Transmission electron microscopes: JEOL JEM 2100F equipped with an EDX detector for chemical analysis (JEOL JED-2300T) and a tomographic capabilities. JEM 2011 equipped with an EDX detector (Bruker, XFlash)
  • Clean room facilities: photo-, laser , e-beam and ion-beam (Raith GmbH) lithographies, etching (RIE, Ar sputtering), evaporation (metals), sputtering (metals and SiO2, Si3N4), electrical measurements
  • X-ray diffraction: INEL (CPS 120), Rikagu rotating anode + mar345 2D detector, PANalytical (X'Pert PRO)
  • Atomic force microscope (Nanoscope Digital Instruments and PSIA)